PVD Multi-arc Magnetron Sputtering Composite Coating Machine Vacuum Metallizing Equipment

The technical core of the microwave multi-arc ion plating equipment lies in "microwave plasma collaborative multi-arc discharge", which has formed the following unique features:

• Dual plasma source synergy, dual enhancement of ionization rate and activity The equipment integrates a "multi-arc cathode target" and a "microwave plasma source" (commonly a 2.45GHz microwave source). Multi-arc discharge provides target material ions (such as Ti, Cr, Al, etc.), and microwave excites the working gas (such as N₂, Ar, CH₄, etc.) to generate auxiliary plasma. After the superposition of the two, the ionization rate of the plasma can reach over 90%. Moreover, the concentration of active particles (atoms, ions, free radicals) has significantly increased, providing a basis for the dense growth of the film layer.
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• The growth environment of the film layer is controllable, and the structure and performance are precisely regulated. By adjusting parameters such as microwave power, multi-arc current, vacuum degree, and bias voltage, the plasma density, ion energy, and the proportion of active particles can be precisely controlled. This enables the targeted optimization of the film layer structure (such as nanocrystalline, amorphous, and multi-layer composite structures) and performance (hardness, toughness, and friction coefficient), meeting the customized requirements of different scenarios.
• Low temperature and high efficiency in balance, suitable for heat-sensitive substrates Microwave plasma features "high activity at low temperatures", enabling efficient coating within the low-temperature range of 100-400℃ (the temperature for traditional multi-arc coating is mostly 150-500℃). Moreover, it can reduce the energy required for target material evaporation through micromicrowave assistance, preventing deformation, hardness reduction or microstructure deterioration of the substrate due to high temperatures. It is compatible with heat-sensitive workpieces such as high-speed steel, precision alloys, and polymer materials.
• The film layer has few defects and excellent surface quality The "cleaning and activation" effect of microwave plasma can effectively remove the micro-oxide layer and contaminants on the surface of workpieces, while suppressing the "Macroparticle" defects that are prone to occur during multi-arc discharge (reducing the deposition of macroparticles through the confinement and bombardment effects of microwave plasma). The final formed film layer is dense and pore-free, with a high surface finish (Ra≤0.05μm), and no subsequent polishing treatment is required.
• Wide adaptability, compatible with complex workpieces and multi-layer film systems Inheriting the multi-target material design of multi-arc ion plating (2-8 cathode targets), it can be matched with single metal targets, alloy targets or composite targets, and combined with microwave-assisted gas dissociation function It can prepare multi-layer film systems such as single-layer films (TiN, CrN), multi-layer films (TiN/TiAlN), composite films (TiAlN/DLC), and gradient films (Ti→TiN→TiAlN). At the same time, by optimizing the target position layout and microwave field distribution, uniform coating of complex-shaped workpieces such as planes, curved surfaces, deep holes, and small parts can be achieved.

Compared with traditional multi-arc ion plating equipment, magnetron sputtering equipment, etc., microwave multi-arc ion plating equipment has significant performance upgrades and application advantages:

• The comprehensive performance of the film layer has achieved a leapfrog improvement
  • More balanced hardness and toughness: The hardness of the film layer can reach HV2500-4500 (for example, the hardness of micromicrowave assisted TiAlN film is about 3500-4000HV), which is 20%-30% higher than that of traditional multi-arc film layers, and the toughness is better (fracture toughness KIC≥4.5MPa · m¹/²), avoiding the problem of being hard and brittle.
  • Stronger bonding force: The ions activated by microwave form a more stable "metallurgical-chemical composite bond" with the surface of the workpiece. The adhesion of the film layer can reach 40-80N (scratch test method), which is 30%-50% higher than that of the traditional multi-arc film layer, and it is less likely to have peeling and chipping phenomena.
  • Superior environmental resistance: The dense film layer structure and the uniform oxide layer formed with microwave assistance (such as the Al₂O₃ transition layer) significantly enhance its corrosion resistance (neutral salt spray test ≥1000 hours) and high-temperature resistance (TiAlN film can stably operate at 800-1000℃, 200℃ higher than traditional multi-arc film layers).
• Low-temperature coating, expanding the application range of substrates: The minimum coating temperature can be reduced to below 100℃, solving the "adaptation problem" of traditional PVD technology for heat-sensitive substrates such as polymer materials, precision electronic components, and thin-walled parts. For example, it can be directly coated on plastic gears, semiconductor chip casings, and thin-walled molds without affecting the original performance of the substrate.
• Low defect rate and high product qualification rate: The inhibitory effect of microwave plasma on large particles reduces the defect rate of the film layer to below 0.1% (the defect rate of traditional multi-arc film layers is about 1%-3%), which is particularly suitable for high-end products with strict surface quality requirements (such as precision cutting tools, aviation parts, electronic components), significantly improving the production qualification rate.
• Balance efficiency and cost-effectiveness: Retain the high deposition rate of multi-arc ion plating (0.1-1.2μm/min), which is 3-5 times faster than magnetron sputtering, and there is no need to sacrifice efficiency in mass production. Meanwhile, the excellent film layer performance extends the service life of the workpiece by 3 to 15 times (for example, the service life of precision molds is increased by 5 to 8 times), reduces the cost of replacement and maintenance, and has a significant cost-performance advantage in long-term use.
• Green and environmentally friendly, meeting high-end manufacturing standards: The entire process is carried out in a high vacuum environment, without the need for acid and alkali electrolytes or chemical agents. It only consumes target materials and electricity, with no discharge of wastewater, waste gas or waste residue. Moreover, microwave heating has a high efficiency (with an electricity utilization rate of ≥60%), saving 15% to 25% energy compared to traditional multi-arc equipment, which meets the green production requirements of industries such as new energy and high-end manufacturing.

Microwave multi-arc ion coating equipment, with its core advantages of "high performance, low temperature and low defect", has become a key coating equipment in the high-end industrial field. Typical applications include: